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Method used for obtaining highly pure silicon, used as a semiconductor material, is
Options
(a) crystallization
(b) zone refining
(c) oxidation
(d) electro-chemical
Correct Answer:
zone refining
Explanation:
No explanation available. Be the first to write the explanation for this question by commenting below.
Related Questions: - The number of oxygen atoms in 4.4g of CO₂ is
- oxidation state of oxygen in F₂O is
- At room temperature the eclipsed and staggered forms of ethane can not be isolate
- Volume occupied by one molecule of water (density= 1 g cm⁻³) is
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Topics: Surface Chemistry and Isolation of Elements
(88)
Subject: Chemistry
(2512)
Important MCQs Based on Medical Entrance Examinations To Improve Your NEET Score
- The number of oxygen atoms in 4.4g of CO₂ is
- oxidation state of oxygen in F₂O is
- At room temperature the eclipsed and staggered forms of ethane can not be isolate
- Volume occupied by one molecule of water (density= 1 g cm⁻³) is
- Chloroform,on warming with Ag power,gives
Topics: Surface Chemistry and Isolation of Elements (88)
Subject: Chemistry (2512)
Important MCQs Based on Medical Entrance Examinations To Improve Your NEET Score
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